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Partnerships

IS&T is seeking partners who want to take advantage of our expertise in long-range R&D in information science and technology. Among our current successes are:

  • R&D 100 winner Extreme Ultraviolet Lithography (EUVL), an ongoing collaboration between three national laboratories (LLNL, Sandia, LBL) and industry partners (Intel, Motorola, AMD). Together, we are developing the capability for short-wavelength (~13 nm) projection lithography to produce integrated circuits with features less than 0.10 microns.

  • R&D 100 winner HERMES continues its partnership with the Federal Highway Administration. HERMES is a nondestructive bridge inspection method that produces a 3-D image of a bridge deck, much like a CAT scan.

 

 

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For more information, contact:

Sheila Vaidya
Lawrence Livermore National Laboratory
P.O. Box 808, L-395
Livermore, CA 94551
(925) 423-5428
vaidya1@llnl.gov


UCRL-MI-142840